Deposition of AlMgB14 films by sputtering in a non-self-sustained high-frequency discharge
نویسندگان
چکیده
The paper presents the method of plasma-assisted deposition AlMgB14 films in a discharge system that consisted large volume gas plasma generator with thermionic and hollow cathode. An electrode BAM powder was placed plasma. High-frequency voltage 13.56 MHz applied to powder. In contrast traditional RF magnetron deposition, use made it possible significantly increase rate for reduce pressure working gas. modes generation properties were investigated.
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ژورنال
عنوان ژورنال: Journal of physics
سال: 2021
ISSN: ['0022-3700', '1747-3721', '0368-3508', '1747-3713']
DOI: https://doi.org/10.1088/1742-6596/1954/1/012042